GGG/SGGG/NGG Garnetes pro liquida epitaxy.SGGG subatratis substratis pro magneto-optica film. In artibus communicationis opticis adhibentur multum utendi 1.3u et 1.5u isolator opticus, nucleus componentis est cinematographicus YIG vel magnus propinquo posita.
Substratum SGGG optimum est carbunculi epitaxialis ferrei crescentis bismuthi substituti membranae, materia bona YIG,BiYIG,GdBIG.
Res physica et mechanica bona et stabilitas chemicae est.
Applicationes:
YIG, BIG epitaxy film;
Proin machinas;
Substitutus GGG
Possessiones:
Compositio | (Gd2.6Ca0.4)(Ga4.1Mg0.25Zr0.65)O12 |
Crystal Structure | Cubica: a = 12.480 Å , |
wDielectric constanteight | 968,096 |
Confluat Point | ~1730 oC |
Densitas | ~ 7.09 g/cm3 |
duritia | ~ 7.5 ( mohns ) |
Refractivus index | 1.95 |
Dielectric constant | 30 |
Damnum dielectric tangens (10 GHz) | ca.3.0 * 10_4 |
Crystal incrementum methodus | Czochralski |
Crystal incrementum directionis | <111> |
Parametri technicae:
propensio | <111><100> intra ± 15 arcus min |
On Page Distortion undam | <1/4 fluctu@632 |
Diameter Tolerantia | ±0.05mm |
Longitudo tolerantia | ±0.2mm |
Chamfer | 0.10mm@45º |
idipsum | <1/10 fluctus ad 633nm |
Parallelismus | <30 arcus secundis |
Perpendicularitas | <15 arcus min |
Superficiem Quality | 10/5 Scratch/Dig |
Patet Apereture | >90% |
Magnae dimensiones crystallorum | 2.8-76 mm diametro; |